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Patent Searching and Data


Title:
POLYMER STRUCTURE AND USE THEREOF
Document Type and Number:
WIPO Patent Application WO/2024/103246
Kind Code:
A1
Abstract:
The present invention provides a polymer structure and a use thereof. The polymer structure comprises a substrate and a light shielding layer covering at least part of the surface of the substrate; the substrate comprises a first polymer; the light shielding layer comprises a second polymer; the second polymer comprises a structural unit derived from a first ultraviolet absorbing agent; the light shielding layer has a thickness of 1-200 microns; and the first ultraviolet absorbing agent is a multifunctional reactive ultraviolet absorbing agent.

Inventors:
LUO DE-SHUN (CN)
CHENG CHING-HAO (CN)
WU HUANG-MIN (CN)
CHANG WEI-CHUN (CN)
HUANG YI-SHUO (CN)
WU CHI-FENG (CN)
CHEN SI-YUAN (CN)
CHIANG YEN-HEI (CN)
Application Number:
PCT/CN2022/131865
Publication Date:
May 23, 2024
Filing Date:
November 15, 2022
Export Citation:
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Assignee:
CHITEC TECH CO LTD (CN)
International Classes:
B32B27/40; C07D249/20; C08K5/3475; C08L75/04; C09K3/00
Foreign References:
CN112194990A2021-01-08
CN110799502A2020-02-14
CN108047910A2018-05-18
TWI638039B2018-10-11
TW201319186A2013-05-16
CN105968396A2016-09-28
CN112159639A2021-01-01
Attorney, Agent or Firm:
BEIJING HC-IP AGENCY CO., LTD. (CN)
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