Title:
RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2016/159187
Kind Code:
A1
Abstract:
The radiation-sensitive composition according to the present invention contains a polymer having a first structural unit containing an acid-dissociable group, a radiation-sensitive acid generator, and a metal-containing component, wherein the contained amount of the metal-containing component is 0.1 parts by mass or more with respect to 100 parts by mass of the polymer, and an absorbance derived from the metal-containing component in a solution containing only the metal-containing component in an amount of 0.0001 mass% calculated in terms of metal atoms in a measurement solvent having a transmittance of 95% or more in an entire wavelength region of 250-600 nm, is less than 0.01 in the entire wavelength region of 250-600 nm.
Inventors:
NAKAGAWA HISASHI (JP)
SHIRATANI MOTOHIRO (JP)
NARUOKA TAKEHIKO (JP)
NAGAI TOMOKI (JP)
SHIRATANI MOTOHIRO (JP)
NARUOKA TAKEHIKO (JP)
NAGAI TOMOKI (JP)
Application Number:
PCT/JP2016/060569
Publication Date:
October 06, 2016
Filing Date:
March 30, 2016
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| WO2004012012A1 | 2004-02-05 |
Foreign References:
| JP2013025211A | 2013-02-04 | |||
| JP2013083844A | 2013-05-09 | |||
| JP2012185485A | 2012-09-27 | |||
| JP2015031795A | 2015-02-16 |
Attorney, Agent or Firm:
AMANO KAZUNORI (JP)
Kazuki Amano (JP)
Kazuki Amano (JP)
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