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Patent Searching and Data


Title:
REACTION CHAMBER STRUCTURE OF PLASMA DEPOSITION FURNACE
Document Type and Number:
WIPO Patent Application WO/2020/118873
Kind Code:
A1
Abstract:
A reaction chamber structure of a plasma deposition furnace, comprising: an inner layer quartz tube (1) an inner part of which is a reaction chamber (4) for holding a reaction gas; an outer layer quartz tube (2) which is sleeved outside of the the inner layer quartz tube (1) and which is coaxial with the inner layer quartz tube (1), wherein there is a gap between the outer layer quartz tube (2) and the inner layer quartz tube (1); and an inductance coil (3) which is used for ionizing the reaction gas to generate carbon atoms, and which is wound on the inner layer quartz tube (1), the inductance coil (3) extending along the axial direction of the inner layer quartz tube (1), and the inductance coil (3) being connected to a radio frequency power source. The inductance coil (3) ionizes the reaction gas in the reaction chamber (4) to generate carbon atoms, so that graphene is grown on a copper foil or aluminum foil, which is beneficial to energy storage of a lithium ion battery.

Inventors:
YANG BAOLI (CN)
ZHANG YONG (CN)
LI SHIJUN (CN)
WU BO (CN)
Application Number:
PCT/CN2019/072727
Publication Date:
June 18, 2020
Filing Date:
January 22, 2019
Export Citation:
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Assignee:
SHENZHEN HEADQUARTER S C NEW ENERGY TECH CORPORATION (CN)
International Classes:
C23C16/513; C23C16/26
Foreign References:
CN106756884A2017-05-31
CN106756884A2017-05-31
CN204391038U2015-06-10
CN102560434A2012-07-11
CN103668125A2014-03-26
CN108966474A2018-12-07
GB1223455A1971-02-24
Attorney, Agent or Firm:
SHENZHEN KANGHONG INTELLECTUAL PROPERTY AGENT CO., LTD. (CN)
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