SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR CONTROLLING THE OPERATING CONDITION PARAMETER

Title:

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR CONTROLLING THE OPERATING CONDITION PARAMETER

Document Type and Number:

WIPO Patent Application WO/2001/016659

Kind Code:

A1

Abstract:

A semiconductor manufacturing apparatus is so improved that even if an apparatus operating condition parameter is overwritten, the parameter can be reset to the preset value at any standard, shipping, or customer level. The semiconductor manufacturing apparatus comprises a multichamber processing system (4), an object conveying system (8), and a device control system (210) including a storage (214) for storing therein apparatus operating condition parameters and supplying the apparatus operating condition parameters to machine control units (150, 72), which control the processing system (4) and the conveying system (8) according to the apparatus operating condition parameters. The device control system (210) stores the apparatus operating condition parameters for each of the prioritized levels from a standard level inherent to the apparatus to a special level inherent to the user in the storage (214) and develops the apparatus operating condition parameters stored in the storage in memories (102) of the machine control units (150, 72) in order of priority.

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Inventors:

NAGATA MASAYA (US)
SUGAWARA MASAHIRO (JP)

Application Number:

PCT/JP2000/005611

Publication Date:

March 08, 2001

Filing Date:

August 22, 2000

Export Citation:

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Assignee:

TOKYO ELECTRON LTD (JP)
NAGATA MASAYA (US)
SUGAWARA MASAHIRO (JP)

International Classes:

B23Q41/08; G05B19/418; H01L21/00; H01L21/02; (IPC1-7): G05B19/418

Foreign References:

US4630273A	1986-12-16
JPH08129407A	1996-05-21

Other References: