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Title:
SUBSTRATE SUPPORTING TABLE OF EXPOSURE SYSTEM
Document Type and Number:
WIPO Patent Application WO/2001/016654
Kind Code:
A1
Abstract:
A substrate supporting table of an exposure system which eliminates the possibility of sucking air through through-holes in a substrate, facilitates the setup of the substrate supporting table, and provides a high substrate holding capability, comprising three sheets of flat plate-shaped elements; a first element (10), a second element (20), and a third element (30), wherein substrate suction holes (10a) in the first element (10) are provided at positions kept clean of substrate through holes (12a) in the substrate (12).

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Inventors:
MIYAKE EIICHI (JP)
Application Number:
PCT/JP2000/001840
Publication Date:
March 08, 2001
Filing Date:
March 24, 2000
Export Citation:
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Assignee:
SANEI GIKEN CO LTD (JP)
MIYAKE EIICHI (JP)
International Classes:
G03B27/20; (IPC1-7): G03F7/20
Foreign References:
JPS63261249A1988-10-27
JPH04112247U1992-09-30
JPH02304449A1990-12-18
Attorney, Agent or Firm:
Fukami, Hisao (Minamimori-machi 2-chome Kita-ku, Osaka-shi Osaka, JP)
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