TUNING ELECTRODES USED IN A REACTOR FOR ELECTROCHEMICALLY PROCESSING A MICROELECTRONIC WORKPIECE

WIPO Patent Application WO2001090434

A3

A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a numerical of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the numerical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters.

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WILSON GREGORY J (US)
MCHUGH PAUL R (US)
WEAVER ROBERT A (US)
RITZDORF THOMAS L (US)

PCT/US2001/014509

June 16, 2005

May 04, 2001

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SEMITOOL INC (US)
WILSON GREGORY J (US)
MCHUGH PAUL R (US)
WEAVER ROBERT A (US)
RITZDORF THOMAS L (US)

C23C14/54; C23C16/52; C25D5/00; C25D7/12; C25D17/00; C25D21/12; G06F17/50; G06F19/00; H01L21/00; (IPC1-7): C23C16/52; C23C14/54; C25D13/22; C25D21/12

WO1999045567A1	1999-09-10
WO1999015710A1	1999-04-01

US6110345A	2000-08-29
US5368715A	1994-11-29

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