Title:
VAPOR DEPOSITION DEVICE AND METHOD FOR MANUFACTURING EPITAXIAL SILICON WAFER
Document Type and Number:
WIPO Patent Application WO/2020/137021
Kind Code:
A1
Abstract:
This vapor deposition device is provided with a disc-shaped susceptor (3) and a susceptor support member for supporting and rotating the susceptor (3). The susceptor (3) has a plurality of fitting grooves (32). The susceptor support member has a plurality of support pins (53) respectively fitted into the plurality of fitting grooves (32). The fitting grooves (32) include an inclined portion (321B) which, while maintaining the state of being in contact with the support pins (53), allows the support pins (53) to move relative to the fitting grooves (32) in the circumferential direction of the susceptor (3) due to the weight of the susceptor (3), and a positioning portion (321A) which positions the support pins (53), having been moved relatively by the inclined portion (321B), in a specific position in the circumferential direction. The inclined portion (321B) and the positioning portion (321A) are formed continuously in the radial direction of the susceptor (3).
Inventors:
NARAHARA KAZUHIRO (JP)
TSUJI MASAYUKI (JP)
KOMORI HAKU (JP)
TSUJI MASAYUKI (JP)
KOMORI HAKU (JP)
Application Number:
PCT/JP2019/035621
Publication Date:
July 02, 2020
Filing Date:
September 11, 2019
Export Citation:
Assignee:
SUMCO CORP (JP)
International Classes:
H01L21/205; C23C16/24; C23C16/458
Foreign References:
| JP2001522142A | 2001-11-13 | |||
| JP2014138056A | 2014-07-28 | |||
| JP2017501570A | 2017-01-12 | |||
| JP2001127143A | 2001-05-11 |
Attorney, Agent or Firm:
KINOSHITA & ASSOCIATES (JP)
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