Title:
全面エッチングされた電磁波遮蔽フィルムを用いるPDPフィルタ及びその製造方法
Document Type and Number:
Japanese Patent JP2007532010
Kind Code:
A
Abstract:
The present invention relates to a PDP filter and a manufacturing method thereof using a fully etched electromagnetic interference film, and more particularly, to a PDP filter and a manufacturing method thereof in which the separation between an etching portion and a non-etching portion is removed by etching an entire surface of electromagnetic interference film that has been used by selectively etching a predetermined region on a surface to form an effective screen portion (etching portion) separately from a ground portion (non-etching portion), and when an electromagnetic interference film roll having such a structure is cut into a small size in a winding direction of the roller only it can be laminated with other functional films by a roll-to-roll process so as to make it applicable when required by cutting it into a desired size even though the effective size of a PDP is changed.
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Inventors:
Don-Wook Lee
Young-Kun Lee
In-Sok Wan
Sun-Wook Kim
Young-Kun Lee
In-Sok Wan
Sun-Wook Kim
Application Number:
JP2007520245A
Publication Date:
November 08, 2007
Filing Date:
May 08, 2006
Export Citation:
Assignee:
LG HAUSYS,LTD.
International Classes:
H05K9/00; G09F9/00
Attorney, Agent or Firm:
Sumio Tanai
Shinya Mitsuhiro
Shinya Mitsuhiro