Title:
高密度金属酸化物層の製造方法及び当該方法によって製造される層
Document Type and Number:
Japanese Patent JP2010538169
Kind Code:
A
Abstract:
A method for the production of an oxide layer, involving oxidizing a metal surface, wherein the metal surface is electrically connected to an electronic control unit (ECU); wherein the metal oxide layer produced has an amount of metal present in said metal oxide layer that is higher than that present in a metal oxide layer produced by oxidizing the metal surface in the absence of the ECU; or oxidizing an oxidizable non-metallic conductive surface, wherein the oxidizable non-metallic conductive surface is electrically connected to an electronic control unit (ECU); wherein the oxide layer produced is denser than that produced by oxidizing the oxidizable non-metallic conductive surface in the absence of the ECU; and the metal oxide or oxide layers produced thereby.
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Inventors:
Andrew Bee Boker Three
Brent Double Kirby
David Dowling
Brent Double Kirby
David Dowling
Application Number:
JP2010524169A
Publication Date:
December 09, 2010
Filing Date:
September 05, 2008
Export Citation:
Assignee:
Applied Semiconductor International Limited
The Trustees of Princeton University
The Trustees of Princeton University
International Classes:
C23C22/68
Domestic Patent References:
| JP3582511B2 | 2004-10-27 | |||
| JPH0762276B2 | 1995-07-05 | |||
| JP2007092105A | 2007-04-12 |
Attorney, Agent or Firm:
Yasuhiko Murayama
Masatake Shiga
Takashi Watanabe
Shinya Mitsuhiro
Masatake Shiga
Takashi Watanabe
Shinya Mitsuhiro