Title:
下層組成物および下層を像形成する方法
Document Type and Number:
Japanese Patent JP6634234
Kind Code:
B2
Abstract:
A method of forming a pattern comprises diffusing an acid, generated by irradiating a portion of a photosensitive layer, into an underlayer comprising an acid sensitive copolymer comprising an acid decomposable group and an attachment group, to form an interpolymer crosslink and/or covalently bonded to the surface of the substrate. Diffusing comprises heating the underlayer and photosensitive layer. The acid sensitive group reacts with the diffused acid to form a polar region at the surface, in the shape of the pattern. The photosensitive layer is removed to forming a self-assembling layer comprising a block copolymer having a block with an affinity for the polar region, and a block having less affinity than the first. The first block forms a domain aligned to the polar region, and the second block forms a domain aligned to the first. Removing either the first or second domain exposes a portion of the underlayer.
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Inventors:
Peter Trefonas
Philip Dene Fustad
Cynthia Pierre
Philip Dene Fustad
Cynthia Pierre
Application Number:
JP2015145146A
Publication Date:
January 22, 2020
Filing Date:
July 22, 2015
Export Citation:
Assignee:
Rohm and Haas Electronic Materials LLC
International Classes:
G03F7/004; G03F7/40
Domestic Patent References:
| JP2007536389A |
Foreign References:
| WO2009053832A1 | ||||
| US20090035668 | ||||
| WO2008001679A1 | ||||
| WO2011086757A1 | ||||
| WO2007023710A1 | ||||
| WO2010021290A1 | ||||
| WO2006093057A1 |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office