ＳｉＯおよびＳｉＮを含む流動性膜を堆積させる方法

Title:

ＳｉＯおよびＳｉＮを含む流動性膜を堆積させる方法

Document Type and Number:

Japanese Patent JP6929279

Kind Code:

B2

Abstract:

Provided are methods for depositing flowable films comprising SiO or SiN. Certain methods comprise exposing a substrate surface to a siloxane or silazane precursor; exposing the substrate surface to a plasma-activated co-reactant to provide a SiON intermediate film; UV curing the SiON intermediate film to provide a cured intermediate film; and annealing the cured intermediate film to provide a film comprising SiO or SiN.

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Inventors:

Cartager Rakumaru
Sally mark
Thompson david

Application Number:

JP2018520080A

Publication Date:

September 01, 2021

Filing Date:

October 19, 2016

Export Citation:

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Assignee:

APPLIED MATERIALS,INCORPORATED

International Classes:

H01L21/318; C23C16/42; C23C16/455; C23C16/50; H01L21/205

Domestic Patent References:

JP2013515355A
JP2010103495A
JP2013065885A
JP2017535077A
JP2010103484A

Foreign References:

US20110151678
WO2016065219A1

Attorney, Agent or Firm:

Shinichiro Tanaka
Disciple Maru Ken
▲吉▼田和彦
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Takeo Nasu

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