Title:
ANTISTATIC PHOTOGRAPHY BASE
Document Type and Number:
Japanese Patent JPS6017741
Kind Code:
A
Abstract:
A photographic base is protected against the adverse effects resulting from the accumulation of static electrical charges by providing it with a first antistatic hydrophilic layer and a second protective hydrophobic layer coated onto said first layer, said first layer having been formed by coating onto said base a liquid coating composition comprising a hydrophilic non-diffusing sulfonated polymer in the presence of an epoxy-silane compound. The antistatic base is particularly useful for photographic elements comprising at least one photosensitive image-forming layer, on one side thereof, and the first antistatic layer and the second protective layer on the opposite side thereof. The antistatic layer is durable, abrasion-resistant, non-tacky and can withstand the aqueous photographic processings without adverse effects.
Inventors:
ARUBERUTO BARUSETSUKI
Application Number:
JP11743384A
Publication Date:
January 29, 1985
Filing Date:
June 07, 1984
Export Citation:
Assignee:
MINNESOTA MINING & MFG
International Classes:
B32B27/00; C08J7/04; C09D5/00; C09K3/16; B32B27/08; G03C1/85; G03C1/89; (IPC1-7): G03C1/82
Domestic Patent References:
| JPS54127319A | 1979-10-03 | |||
| JPS5862045A | 1983-04-13 | |||
| JPS55140834A | 1980-11-04 |
Attorney, Agent or Firm:
Hideto Asamura
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