Title:
CERAMIC HEATER FOR SEMICONDUCTOR MANUFACTURING/ INSPECTING EQUIPMENT
Document Type and Number:
Japanese Patent JP2002319526
Kind Code:
A
Abstract:
To provide a ceramic heater for semiconductor manufacturing/ inspecting equipment capable of uniformly heating a semiconductor wafer without generating a scattered temperature and capable of rapidly raising the temperature of a semiconductor wafer without dissipating heat during the heating in a semiconductor manufacturing/inspecting process.
This ceramic heater for semiconductor manufacturing/inspecting equipment comprises a ceramic substrate, on the surface or inside of which resistive heating elements are formed. Grooves of circular shapes in plan view are formed at least on the surface of the wafer-heating-face side of the ceramic substrate.
Inventors:
AMINO TOSHIKAZU
Application Number:
JP2001124878A
Publication Date:
October 31, 2002
Filing Date:
April 23, 2001
Export Citation:
Assignee:
IBIDEN CO LTD
International Classes:
H05B3/20; H01L21/02; H01L21/66; (IPC1-7): H01L21/02; H01L21/66; H05B3/20
Attorney, Agent or Firm:
Yasuo Yasutomi (2 outside)