To provide an apparatus for improving fog correction accuracy without depending upon the layout of a pattern.
The drawing apparatus 100 includes a calculation unit 116 which calculates a proximity effect correction irradiation amount d(x) of electron beam drawing for each first mesh area, a calculation unit 112 which calculates a proximity effect correction irradiation amount d'(x) for each second mesh area larger than the first mesh area, an interpolation unit 113 which interpolates the proximity effect correction irradiation amount d'(x) to the area gravity center position of a figure in the second mesh area for each second mesh area, a calculation unit 114 which calculates a fog correction irradiation amount F(x) using the interpolated proximity effect correction irradiation amount d'(x) for each third mesh area, a composition unit 118 which puts the fog correction irradiation amount F(x) and proximity effect correction irradiation amount d(x) together, and a drawing unit 150 which performs drawing based upon the composited correction irradiation amount.
| JPH04366754 | RESIST IMAGE DEFECT INSPECTION DEVICE |
| JP2011159904 | PATTERN FORMING METHOD AND IMPREGNATION DEVICE |
YASHIMA JUN
MATSUMOTO YASUSHI
IIJIMA TOMOHIRO
ABE TAKAYUKI
| JP2007115891A | 2007-05-10 | |||
| JP2007150243A | 2007-06-14 | |||
| JP2007200968A | 2007-08-09 | |||
| JPH11204415A | 1999-07-30 |
Tetsuma Ikegami