Title:
CLEANING METHOD FOR PHOTORECEPTOR SUBSTRATE BY DRY ICE PARTICULATES
Document Type and Number:
Japanese Patent JPH0643680
Kind Code:
A
Abstract:
PURPOSE: To provide the cleaning method of a photoreceptor substrate using dry ice particulates.
CONSTITUTION: The substrate 10 is rotated in the bath of the dry ice particulates 12. Thus, the particulates 12 are locally melted and solidified again. Then, the contaminant of the substrate 10 is caught by the surfaces of the particulates 12. By an inactive gas flow reversely flowing with respect to the particulates 12, dry ice is sublimated. Besides, carbon dioxide and the contaminant are discharged and eliminated. Then, the used dry ice which is not sublimated is discharged from a dry ice discharge port 26.
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Inventors:
YUUJIIN EI SUUEIN
Application Number:
JP4408093A
Publication Date:
February 18, 1994
Filing Date:
March 04, 1993
Export Citation:
Assignee:
XEROX CORP
International Classes:
B08B7/02; B08B7/00; B24B31/10; B24C1/00; G03G5/00; G03G5/08; G03G5/10; (IPC1-7): G03G5/10; B08B7/02; B24C1/00; G03G5/08
Attorney, Agent or Firm:
Minoru Nakamura (6 outside)
Next Patent: ELECTROPHOTOGRAPHIC SESITIVE BODY AND ITS PRODUCTION