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Patent Searching and Data


Title:
CLEANSING COSMETIC
Document Type and Number:
Japanese Patent JP2012201622
Kind Code:
A
Abstract:

To provide a cleansing cosmetic effectively removing makeup cosmetics such as mascara, lipstick, and foundation applied to a skin and UV protective cosmetics, giving a skin freshness with no stickiness after cleansing, and excellently spreading in use.

The cleansing cosmetic includes: (A) 2-20 mass% of a 12-20C fatty acid salt; (B) 5-30 mass% of an oil which is liquid at 25°C; (C) 0.2-3 mass% of an acrylic polymer comprising constitutional monomers (c1), (c2), and (c3); and (D) water. The total contents (A)+(B)+(C)+(D) of the components (A), (B), (C) and (D) is 100 mass%, and a mass ratio (A)/(B) of the component (A) to the component (B) is 1/3 to 2/1. The constitutional monomer (c1) is acrylic acid or methacrylic acid. The constitutional monomer (c2) is alkyl acrylate or alkyl methacrylate. The constitutional monomers (c3) is an ester of acrylic acid or methacrylic acid and a compound prepared by adding 15-30 molar ethylene oxide to a 16-22C higher alcohol.


Inventors:
MURAKAMI DAI
ODA YOSHIJI
Application Number:
JP2011066833A
Publication Date:
October 22, 2012
Filing Date:
March 24, 2011
Export Citation:
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Assignee:
NOF CORP
International Classes:
A61K8/36; A61K8/81; A61Q1/14; A61Q19/10; C11D1/04; C11D3/18; C11D3/20; C11D3/37
Attorney, Agent or Firm:
Yoneda Keikei