Title:
ELECTRON BEAM LITHOGRAPHY APPARATUS
Document Type and Number:
Japanese Patent JPS577929
Kind Code:
A
Abstract:
PURPOSE:To enhance the workability without waiting time after a stage has moved, by mounting a cassette, which has a spring which connects the cassette to one side of the stage and a piezoelectric element that is connected to the other side of the stage, and stops the vibration, on the stage, and performing exposure. CONSTITUTION:On the stage having a shaft 2 which is connected to a pulse motor, is mounted the cassette 4 having the spring 5 on one end and the piezoelectric element 6 on the other end. The cassette holds a material to be exposed 3. With the position being sensed by a laser length measuring device 7, the stage is moved by the shaft 2. Immediately after the movement, the vibration whose phase is opposite to that of the vibration of the cassette is applied to the cassette from the piezoelectric element, and the vibration of the cassette is stopped. Since the vibration can be stopped in a very short time, the waiting time after the movement of the stage becomes zero, and the workability of the electron beam exposure can be enhanced.
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Inventors:
FUKUDA HISASHI
Application Number:
JP8225280A
Publication Date:
January 16, 1982
Filing Date:
June 17, 1980
Export Citation:
Assignee:
SANYO ELECTRIC CO
International Classes:
H01L21/027; H01J37/34; (IPC1-7): H01L21/30
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