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Title:
MANUFACTURING METHOD FOR FUNCTIONAL DEVICE
Document Type and Number:
Japanese Patent JP2007073708
Kind Code:
A
Abstract:

To provide a manufacturing method for simply and effectively conducting the patterning of an organic thin-film eliciting the function of at least a part of a functional device and the crystallization of large crystal grains.

The manufacturing method for the functional device contains a process conducting a substrate-surface treatment, in which the surface tension σ1 of the pattern forming section of a substrate surface is made larger than that σs of the melted liquid of an organic material, and the surface tension σ2 of the pattern non-forming section of the substrate surface is made smaller than that σs. The manufacturing method for the function device further contains the process in which the thin-film composed of the organic material is formed on the substrate surface, and the process in which the thin-film is heated at the melting point or higher and cooled and the crystallized organic thin-film is formed only on the pattern forming section.


Inventors:
NAKAYAMA KENTARO
SAITO KIMIHIKO
SHICHIJO SHIRO
Application Number:
JP2005258377A
Publication Date:
March 22, 2007
Filing Date:
September 06, 2005
Export Citation:
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Assignee:
MITSUI CHEMICALS INC
International Classes:
H01L51/40; H01L21/336; H01L29/786; H01L51/05; H01L21/20
Domestic Patent References:
JP2004146502A2004-05-20
JP2004349640A2004-12-09
JP2005520668A2005-07-14
JP2004297011A2004-10-21



 
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