To provide a method and apparatus for forming an insulating film in which pores are uniformly formed.
1, 3, 5-trimethyl-1, 3, 5-trivinyl-cyclotrisiloxane (V3D3) and isopropyl alcohol (IPA) are supplied to a chamber 12, and are excited to generate molecular active species of these compounds by a plasma. These active species are allowed to react each other near the surface of a substrate to form, for example, a thin insulating film containing IPA molecules with a thickness of 50 nm. Furthermore, the IPA molecules contained in the thin film are selectively removed by plasma processing using an ammonia gas to form pores uniformly in the thickness direction. By repeating the film forming step and the pore forming step for a plurality of times, an insulating film which has a prescribed thickness and in which pores are uniformly formed can be obtained.
KAGAWA KEIEI
KAWAMURA GOHEI
TEI MOTOICHI
