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Title:
METHOD AND DEVICE FOR SHIELDING SECONDARY X-RAY FROM ELECTRON BEAM IRRADIATING DEVICE FOR FINE LINE
Document Type and Number:
Japanese Patent JP2001226149
Kind Code:
A
Abstract:

To secure safe working environment without losing work efficiency by simply shielding secondary X-rays generated at the time of irradiating a coating material applied on fine lines with electron beams.

The method for shielding secondary X-rays emitted from the electron beam irradiating device for the fine line is characterized by shielding the secondary X-rays generated by electron beam irradiation by providing X-ray shielding tubes at an entrance and an exit of the fine line in the electron beam irradiating device for irradiating the coating material applied on the fine line with the electron beams to execute curing.


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Inventors:
OBA TOSHIO
KAWADA ATSUO
UENO MASAYA
Application Number:
JP2000040438A
Publication Date:
August 21, 2001
Filing Date:
February 18, 2000
Export Citation:
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Assignee:
SHINETSU CHEMICAL CO
International Classes:
C03C25/12; G02B6/44; G21K5/10; H01J37/09; (IPC1-7): C03C25/12
Attorney, Agent or Firm:
Takashi Kojima (1 person outside)



 
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