To provide a method for forming an oxide superconductive film, which forms a thick oxide-superconductive film with high superconducting characteristics by improving a film-forming rate, in the method for forming the oxide superconductive film with the use of a laser vapor-deposition process.
In the method for forming the oxide superconductive film by irradiating a target 15 with a laser beam through an external optical system, sputtering or evaporating particles of composing the target 15, to form a jet 15a of the vapor-deposition particles, and depositing the above vapor-deposition particles on the surface of the substrate, this film-forming method comprises controlling the film-forming rate of the oxide superconductive film by adjusting the above external optical system, and controlling a composition of the vapor-deposition particles emitted from the target 15, by using the above target 15 which includes the same composing elements as the oxide superconductive film to be formed but has a different content of the elements included in the target 15 from the film, depending on the film-forming rate of the above oxide superconductive film.
IIJIMA YASUHIRO
Tadashi Takahashi
Takashi Watanabe
Masakazu Aoyama
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