To provide a method for manufacturing an exposure apparatus and device capable of keeping clean the surface of an optical element and suppressing attached materials from depositing, by efficiently supplying a clean gas near the surface of the optical element, separated from ambient atmosphere, on the side near the ambient atmosphere; reducing the effect of the gas flow as much as possible on the imaging performance in imaging position adjustment; and efficiently preventing contaminations of the surface of the optical element with a very small amount of gas.

The exposure apparatus is so configured that a gas supply means has two or more gas supply inlets; a gas exhaust means has two or more gas exhaust exits; and the gas is supplied in a local laminar flow with respect to the surface of a projected surface side of a final optical element, by supplying the gas to the surface of the projected surface side of the final optical element from the two or more gas supply inlets, and discharging the supplied gas from the two or more gas exhaust exits.