METHOD OF PATTERNING DIAMOND FILM - SUMITOMO ELECTRIC INDUSTRIES

Title:

METHOD OF PATTERNING DIAMOND FILM

Document Type and Number:

Japanese Patent JPH01123422

Kind Code:

A

Abstract:

PURPOSE: To form a pattern of diamond film simply, by forming a negative pattern film on a substrate, growing a diamond film, and removing both the negative pattern film and the diamond film on the negative pattern film.

CONSTITUTION: A negative pattern film 12 comprising a mask material is formed on a substrate 11. A diamond film 13 is grown on the surface of the negative pattern film 12 and the surface of the substrate 11. When the negative pattern film 12 is removed, the diamond film 13 thereon is also removed, and the intended pattern of the diamond film 13 is formed. The substrate 11 comprises metals of groups IVa, Va and VIa in the periodic table, an Si substrate, carbide and the like. The mask material comprises transition metals of groups IVa, Va and VIa in the periodic table, an Si substrate, carbide and the like. Thus the pattern of the diamond film 13 is simply formed.

Inventors:

NAKAHATA HIDEAKI
IMAI TAKAHIRO
FUJIMORI NAOHARU

Application Number:

JP28135887A

Publication Date:

May 16, 1989

Filing Date:

November 07, 1987

Export Citation:

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Assignee:

SUMITOMO ELECTRIC INDUSTRIES

International Classes:

H01L21/205; H01L21/302; H01L21/306; H01L21/3065; H01L29/78; H01L29/786; (IPC1-7): H01L21/205; H01L21/302; H01L21/306; H01L29/78

Domestic Patent References:

JPH08166017A

1996-06-25

Attorney, Agent or Firm:

Aoyama Ryo (1 person outside)

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