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Title:
フッ化水素ガスを用いる高純度溶液の調製方法
Document Type and Number:
Japanese Patent JP4084929
Kind Code:
B2
Abstract:
The invention relates to a method for producing a high-purity solution that contains hydrogen fluoride or a salt thereof or a mixture of two or more thereof. The inventive method comprises the following step (i): hydrogen fluoride is passed into at least one anhydrous solvant. The method is characterised in that hydrogen fluoride is passed into the at least one anhydrous solvant as a gas or liquid gas or as a mixture of gas and liquid gas.

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Inventors:
Sievert, Wolfgang
Application Number:
JP2000607921A
Publication Date:
April 30, 2008
Filing Date:
March 29, 2000
Export Citation:
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Assignee:
Honeywell Specialty Chemicals Zeerze Geembehr
International Classes:
C09K13/08; C01B7/01; C01B7/09; C01B7/19; H01L21/306; H01L21/311
Domestic Patent References:
JP57169245A
JP5326480A
JP2001527697A
JP9507613A
JP10022251A
JP50148299A
JP8160457A
JP11060275A
JP2005528316A
Foreign References:
WO1997002958A1
Attorney, Agent or Firm:
Kazuo Shamoto
Shosuke Imai
Tadashi Masui
Yasushi Kobayashi
Hiroyuki Tomita
Minako Matsuyama



 
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