Title:
METHOD FOR REMOVING POSI-TYPE PHOTORESIST
Document Type and Number:
Japanese Patent JPS5267629
Kind Code:
A
Abstract:
PURPOSE: To provide a method for removing posi-type photoresist of naphthoquine diazide type at normal temperature using hydrazine (aqueous solution), with washing after removal being performed with cheap water.
More Like This:
| JPH07125838 | POSITIONING TABLE DEVICE |
| JPS62286230 | SELECTIVE ETCHING OF THIN FILM |
| JPS617629 | ION BEAM EXPOSING AND DEVELOPING PROCESS |
Inventors:
YAMAGUCHI HISAO
Application Number:
JP14299475A
Publication Date:
June 04, 1977
Filing Date:
December 03, 1975
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H01L21/30; G03F7/30; G03F7/32; G03F7/42; H01L21/027; (IPC1-7): B41N3/06; G03C5/24; H01L21/306