Title:
METHOD OF WASHING CRYSTALLIZED GLASS SUBSTRATE
Document Type and Number:
Japanese Patent JP2002167240
Kind Code:
A
Abstract:
To provide a method of washing a crystallized glass substrate removing remained abrasive particles effectively without generating tiny depressions on the surface of the substrate.
This method of washing to remove abrasive particles from a crystallized glass substrate having abrasive particles remained on the surface comprises dipping the crystallized glass substrate 14 into a washing liquid 12 in a washing tank 10 and washing with ultrasonic wave having frequency of 600 kHz or higher emitted from an ultrasonic wave generator 11 equipped at the bottom of the washing tank 10.
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Inventors:
SUEMATSU TAKAAKI
SAWARA TERUTAKA
KITADA YOSHIMITSU
SAWARA TERUTAKA
KITADA YOSHIMITSU
Application Number:
JP2000362209A
Publication Date:
June 11, 2002
Filing Date:
November 29, 2000
Export Citation:
Assignee:
HITACHI PLANT ENG & CONSTR CO
International Classes:
G02F1/13; B08B3/12; C03C23/00; C11D7/10; C11D17/08; G11B5/84; (IPC1-7): C03C23/00; B08B3/12; C11D7/10; C11D17/08; G02F1/13; G11B5/84
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