Title:
MONOLITHIC MODULAR MICROWAVE SOURCE HAVING INTEGRAL TEMPERATURE CONTROL
Document Type and Number:
Japanese Patent JP2023166392
Kind Code:
A
Abstract:
To form a housing of a source assembly for an applicator to improve the uniformity of plasma.SOLUTION: An embodiment disclosed in the present specification includes a housing for a source assembly. In the embodiment, the housing includes: a conductive body having a first surface and a second surface opposite to the first surface; and a plurality of openings having the thickness of a conductive body between the first surface and the second surface. In an embodiment, the housing includes: a channel into the first surface of the conductive body; and a cover on the channel. In an embodiment, a first stem on the cover extends to a direction distant from the first surface and a second stem on the cover extends to a direction distant from the first surface. In an embodiment, the first stem and the second stem open in the channel.SELECTED DRAWING: Figure 1
Inventors:
JAMES CARDUCCI
RICHARD C FOVELL
LARRY D ELIZAGA
SILVERST RODRIGUES
CHUA THAI CHENG
PHILIP ALLAN KRAUS
RICHARD C FOVELL
LARRY D ELIZAGA
SILVERST RODRIGUES
CHUA THAI CHENG
PHILIP ALLAN KRAUS
Application Number:
JP2023130535A
Publication Date:
November 21, 2023
Filing Date:
August 09, 2023
Export Citation:
Assignee:
APPLIED MATERIALS INC
International Classes:
H05H1/46
Attorney, Agent or Firm:
Sonoda & Kobayashi Patent Attorneys Corporation
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