To provide a pattern exposure device capable of being operated by an ultraviolet light having a wavelength of 300 nm or less.
In a pinhole board 300 with a micro-lens array, an optical thin-film 303 is evaporated on the underside of a quartz board 302 on which a large number of indentations are formed, and a chromium film is evaporated on the underside of the optical thin-film 303 as the pinhole board 304. Sapphire (Al2O3) is used as the optical thin-film 303. Since sapphire has a refractive index of approximately 1.84 in the wavelength of 248 nm and the refractive index is higher than quartz of approximately 1.51, the optical thin-film 303 functions as the convex lens-shaped micro-lens array. Accordingly, the incident ultraviolet light L14 proceeds while being throttled in the optical thin-film 303 as the micro-lens array. The chromium film functioning as the pinhole board 304 is attached on the underside of the optical thin-film 303 as the light collecting section of the micro-lens array.
SUGAWA SHIGETOSHI
YANAGIDA KIMIO
TAKEHISA KIWAMU
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