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Title:
PATTERN FORMATION METHOD
Document Type and Number:
Japanese Patent JP2010238750
Kind Code:
A
Abstract:

To provide a pattern formation method that can form fine patterns simply and effectively and is reduced in the occurrence of a defect.

The pattern formation method includes at least steps of providing at least one of a patterned object 23 and a molded structure 21 having a concavo-convex portion on the surface with an active species supply source and bringing the concavo-convex portion of the molded structure into contact with the patterned object 23, and an oxide film formation step of irradiating exciting light to the active species supply source and forming an oxide film on the surface of the patterned object 23.


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Inventors:
WAKAMATSU TETSUSHI
YAMASHITA NORIKO
Application Number:
JP2009082457A
Publication Date:
October 21, 2010
Filing Date:
March 30, 2009
Export Citation:
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Assignee:
FUJIFILM CORP
International Classes:
H01L21/027; G11B5/84; G11B5/855; H01L21/768; H01L23/522
Domestic Patent References:
JP2008047797A2008-02-28
JP2007073712A2007-03-22
JP2007069301A2007-03-22
JP2003236390A2003-08-26
JP2009016815A2009-01-22
JP2008517329A2008-05-22
JP2011511461A2011-04-07
JP2008047797A2008-02-28
JP2007073712A2007-03-22
JP2007069301A2007-03-22
JP2003236390A2003-08-26
JP2009016815A2009-01-22
JP2008517329A2008-05-22
JP2011511461A2011-04-07
Attorney, Agent or Firm:
Koichi Hirota
Yoshihiro Nagare
Naoko Matsuda
Hiroshi Ikeda



 
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