Title:
PHOTO-CHEMICAL CLEANING DEVICE USING ULTRAVIOLET-RAY AND OZONE
Document Type and Number:
Japanese Patent JP3271998
Kind Code:
B2
Abstract:
PURPOSE: To provide the title cleaning device capable of cleaning an L-B film forming substrate within a short time.
CONSTITUTION: An L-B film forming substrate cleaning device A is equipped with a cleaning box 1 having a cleaning chamber 11, the low pressure mercury lamp 2 attached to the ceiling part within the cleaning chamber 11, the sample shelf 3 arranged to the central part of the cleaning chamber 11, the IP light source 4 arranged to the bottom part of the cleaning chamber 11 and a gas replacing means 5 introducing oxygen gas into the cleaning chamber 11 before cleaning is started and replacing the gas in the cleaning chamber 11 with nitrogen gas.
Inventors:
Katsumi Yoneda
Haruo Tajima
Haruo Tajima
Application Number:
JP19535291A
Publication Date:
April 08, 2002
Filing Date:
August 05, 1991
Export Citation:
Assignee:
Nippon Laser Electronics Co., Ltd.
International Classes:
B01J19/00; B01J19/12; B08B7/00; C01B13/10; H01L21/304; (IPC1-7): B01J19/12; B01J19/00; B08B7/00; C01B13/10
Domestic Patent References:
| JP61194830A | ||||
| JP59193030A |
Attorney, Agent or Firm:
Kenichi Ito
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