Title:
PLANAR ANTENNA, PLASMA TREATING APPARATUS AND METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP3430959
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a planar antenna, capable of preventing abnormal discharges due to electrostatic focusing and turning on the large power.
SOLUTION: In a planar antenna 66 for introducing microwaves for generating plasma from a plurality of slots 84 into a treatment vessel, capable of being evacuated and having a base therein on which a member to be processed is placed, the slots 84 are surrounded by a curve into a planar shape. This can restrain abnormal discharges due to electrostatic focusing, while turning on the large power.
More Like This:
| JPH01123422 | METHOD OF PATTERNING DIAMOND FILM |
| JP3103568 | Substrate carrier with textured film |
| JP3011492 | [Title of Invention] Etching Method |
Inventors:
Toshiaki Hongo
Application Number:
JP5774699A
Publication Date:
July 28, 2003
Filing Date:
March 04, 1999
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/302; C23C16/511; H01J37/32; H01L21/3065; C23C16/50; (IPC1-7): H01L21/3065
Domestic Patent References:
| JP4361529A | ||||
| JP320460A | ||||
| JP1283359A | ||||
| JP9181052A |
Other References:
【文献】国際公開98/033362(WO,A1)
Attorney, Agent or Firm:
Akihiro Asai
Previous Patent: GAS SEPARATION FROM VAPOR-PHASE CARBON FIBER AND APPARATUS THEREFOR
Next Patent: VEHICLE CONTROLLER
Next Patent: VEHICLE CONTROLLER