Title:
PLASMA PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP2023001978
Kind Code:
A
Abstract:
To reduce the plasma density generated on the substrate side during plasma processing and suppress the temperature rise of a substrate.SOLUTION: A plasma processing device 100 for generating plasma in a vacuum vessel 2 by applying a high-frequency current to an antenna structure 5 arranged in the vacuum vessel 2 and processing a substrate W using the plasma includes a magnetic cover 7 provided so as to cover a part or all of the substrate-side surface of the outer peripheral surface of the antenna structure.SELECTED DRAWING: Figure 1
Inventors:
DAIMARU TOMOHIRO
Application Number:
JP2021102925A
Publication Date:
January 10, 2023
Filing Date:
June 22, 2021
Export Citation:
Assignee:
NISSIN ELECTRIC CO LTD
International Classes:
H05H1/46; C23C14/34; C23C16/509
Attorney, Agent or Firm:
Nishimura Ryuhei
Shindai Saito
Nakamura Atsushi
Haruko Maeda
Shindai Saito
Nakamura Atsushi
Haruko Maeda