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Title:
POSITIVE TYPE RESIST COMPOSITION AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP3672780
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a positive type resist composition usable for laser light in the vacuum ultraviolet region as a positive type resist composition containing an acrylic resin whose solubility to an alkaline aqueous solution is varied by the action of an acid and further containing an acid generating agent.
SOLUTION: A polymer containing an acrylic ester or methacrylic ester unit whose ester moiety is a group having a fluorine atom as a constituent unit is used as the acrylic resin.


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Inventors:
Kentaro Tsutsumi
Mitsutaka Otani
Kazuhiko Maeda
Application Number:
JP33870199A
Publication Date:
July 20, 2005
Filing Date:
November 29, 1999
Export Citation:
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Assignee:
Central Glass Co., Ltd.
International Classes:
H01L21/027; C08F220/22; G03F7/004; G03F7/039; (IPC1-7): G03F7/039; C08F220/22; H01L21/027
Domestic Patent References:
JP11231539A
JP2002006501A
JP10301283A
JP10186665A
JP11084659A
JP11024274A
JP10177247A
JP2000321774A
Attorney, Agent or Firm:
Yoshiyuki Nishi



 
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