Title:
熱エッチングおよび原子層エッチングにおけるエッチング特性の予測
Document Type and Number:
Japanese Patent JP7402179
Kind Code:
B2
Abstract:
Etch in a thermal etch reaction is predicted using a machine learning model. Chemical characteristics of an etch process and associated energies in one or more reaction pathways of a given thermal etch reaction are identified using a quantum mechanical simulation. Labels indicative of etch characteristics may be associated with the chemical characteristics and associated energies of the given thermal etch reaction. The machine learning model can be trained using chemical characteristics and associated energies as independent variables and labels as dependent variables across many different etch reactions of different types. When chemical characteristics and associated energies for a new thermal etch reaction are provided as inputs in the machine learning model, the machine learning model can accurately predict etch characteristics of the new thermal etch reaction as outputs.
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Inventors:
Lil Toll Stainless
Fisher Andreas
Berry the Third Ivan El.
Drager Nerissa Sue
Gotcho Richard A.
Fisher Andreas
Berry the Third Ivan El.
Drager Nerissa Sue
Gotcho Richard A.
Application Number:
JP2020561639A
Publication Date:
December 20, 2023
Filing Date:
April 23, 2019
Export Citation:
Assignee:
LAM RESEARCH CORPORATION
International Classes:
H01L21/302; G06N20/00; H01L21/3065
Domestic Patent References:
| JP2017135365A | ||||
| JP2001168076A | ||||
| JP2014041849A | ||||
| JP9313925A |
Foreign References:
| WO2011115023A1 | ||||
| US20170176983 | ||||
| US20130013253 |
Attorney, Agent or Firm:
Patent Attorney Corporation Meisei International Patent Office
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