To provide a safe, easy process for forming a high-temperature corrosion-resistant surface of an incinerator wherein a silicon dioxide coated film can sufficiently exert its effect by preventing decrease in workability of a material to be treated.
A silicide-diffused layer or a silicon dioxide-coated layer is formed on the surface of a metal for the incinerator by maintaining the metal material to be treated, which has a mixed slurry of silicon and silicon dioxide applied thereto or implanted therein, in an inert gas at a predetermined, elevated temperature. This method enables to prevent decrease in workability which occurs when silicon is used alone and form a modified layer having a fine surface with few irregularity. Here, the temperature is preferably controlled to 1,000-1,250°C. Since addition of sodium fluoride to the mixed powder activates silicide formation, the diffused layer having a thickness of ≥100 μm can be formed, even at a low temperature of ≤1,000°C. Use of a fine particle with a powder grain size of ≤1 μm increases area of contact with the metal and improves efficiency of surface treatment.
IZUMIYA KOICHI
HAMANAKA YOSHITAKA
IRIE TAKAHIRO
Tatsuyuki Unuma