PURPOSE: To provide a programmable device having programming area with reduced parasitic capacitance and stable characteristics.

CONSTITUTION: An insulating film 18 with two thin window areas is formed between a lower electrode 12 and an upper electrode 15. When a voltage is applied between the upper and lower electrodes, programming areas 16 of the insulating film 18 are subjected to dielectric breakdown. The programming area is defined by a region where the upper and lower electrodes and the window overlap. The programming area can be smaller than the minimum size limited by process technology. Since the sum of the two programming areas is constant, characteristics of a programmable device are fairly stable even if mask registration is not perfect.