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Title:
REMOVING APPARATUS, EXPOSURE APPARATUS INCLUDING THE SAME, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2006120895
Kind Code:
A
Abstract:

To provide a removing apparatus capable of removing fine particles adhering to a surface of a reticle etc. to be inspected with an excellent removing capability without imparting any damage to the surface to be inspected, and to provide an exposure apparatus including the removing apparatus and a device manufacturing method.

The removing apparatus is to remove fine particles adhering to the surface to be inspected having a 3D structure. The removing apparatus includes a plurality of light sources, irradiation means for irradiating the surface to be inspected with a plurality of light beams emitted from the plurality of the light sources from different directions, and dust collection means for collecting the fine particles by scanning the plurality of the light beams.


Inventors:
OKUBO SHIYOURITSU
YAMAZOE KENJI
OSAWA MASARU
Application Number:
JP2004307860A
Publication Date:
May 11, 2006
Filing Date:
October 22, 2004
Export Citation:
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Assignee:
CANON KK
International Classes:
H01L21/027; G03F1/24; G03F1/72; G03F7/20
Domestic Patent References:
JP2002273592A2002-09-25
JP2002343761A2002-11-29
JP2001269636A2001-10-02
JP2003303800A2003-10-24
JPH1126411A1999-01-29
JP2001300450A2001-10-30
JPH0671164A1994-03-15
Attorney, Agent or Firm:
Ryosuke Fujimoto



 
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