Title:
RESIST COMPOSITION FOR BLACK MATRIX AND BLACK MATRIX USING THE SAME
Document Type and Number:
Japanese Patent JP3869517
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resin black matrix whose light shielding performance is extremely high even in a low film thickness and which has high resistance by forming a dispersant having a basic functional group, substantially constituting pigment only of carbon black, and also specifying film resistance of a dry film thickness.
SOLUTION: A resist composition for a black matrix contains a photosensitive resin, pigment, a dispersant and a solvent. The dispersant has a basic functional group, and the pigment is substantially constituted only of carbon black, and film resistance in a dry film thickness of 1μm is set not less than 109Ω/square. Preferably, the transmitted light concentration in the dry film thickness of 1μm is set not less than 3. A rate of the pigment to the total of this photosensitive resin, the pigment and the dispersant is set to 30 to 80wt.%. A DBP oil absorbing quantity of the carbon black is set not more than 100ml/100g. The nitrogen adsorbing surface area is set not more than 100m2/g. The photosensitive resin contains a compound having an ethylenic double bond and a photopolymerization initiator.
Inventors:
Makoto Kawana
Hidesuke Fujiwara
Morishita Rinro
Hidesuke Fujiwara
Morishita Rinro
Application Number:
JP6053397A
Publication Date:
January 17, 2007
Filing Date:
March 14, 1997
Export Citation:
Assignee:
Mitsubishi Chemical Corporation
International Classes:
G02B5/20; G03F7/004; C09D5/00; G02B5/00; H01J9/227; (IPC1-7): G02B5/20; C09D5/00; G02B5/00; G03F7/004; H01J9/227
Domestic Patent References:
| JP933716A | ||||
| JP943412A | ||||
| JP60237403A | ||||
| JP743522A | ||||
| JP922653A | ||||
| JP635188A |
Attorney, Agent or Firm:
Hasegawa Soji
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