PURPOSE: To prevent pitch deviation in automatic positioning by forming discrimination lines with rather large pitches on scribe lines.

CONSTITUTION: A plurality of integrated circuits are formed in an array on a semiconductor substrate 1. Scribe lines 2 to isolate the integrated circuits are formed in a lattice type. Each group A constituted of 20 integrated circuits wherein five integrated circuits are transversely arranged and four integrated circuits are longitudinally arranged is divided by discrimination lines 3 on a substrate 1. The discrimination lines 3 are formed on the scribe lines 2. In this case, a photo mask is moved in the manner in which the scribe lines become thick on the boundaries of blocks of a constant number, and the pattern of integrated circuits is printed on the substrate, thereby forming discrimination lines 3a.