SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Title:

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Document Type and Number:

Japanese Patent JP2023104694

Kind Code:

A

Abstract:

To provide a substrate processing apparatus and a processing liquid supply method capable of recovering the impurity removing ability without exchanging a filter when the impurity removing ability of the filter is lowered.SOLUTION: A substrate processing apparatus 1 includes a processing unit 2 that processes a substrate W with a processing liquid, a recovery tank 20 that recovers a processing liquid from the processing unit 2, a first pH adjustment unit 90 that adjusts the pH of the processing liquid in the recovery tank 20, a regeneration tank 30 to which the processing liquid is sent from the recovery tank 20, and a gel filter 50 that collects impurities from the processing liquid in the regeneration tank 30 and releases impurities into the processing liquid in the regeneration tank 30 according to changes in the pH of the processing liquid in the regeneration tank 30.SELECTED DRAWING: Figure 1

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Inventors:

LINDA HO
INABA MAKI
TAHARA KANA

Application Number:

JP2022005841A

Publication Date:

July 28, 2023

Filing Date:

January 18, 2022

Export Citation:

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Assignee:

SCREEN HOLDINGS CO LTD

International Classes:

H01L21/304

Attorney, Agent or Firm:

Patent Attorney Corporation Ai Patent Office

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