Title:
VAPOR DEPOSITION MATERIAL
Document Type and Number:
Japanese Patent JP3103458
Kind Code:
B2
Abstract:
PURPOSE: To produce a vapor deposition material excellent in toughness as well as in workability into wire so that stable vapor deposition conditions can be obtained at the time of vapor-depositing a Co-Ni alloy onto a base film at the production of VTR tape, etc.
CONSTITUTION: This alloy is a Co alloy containing ≤30wt.% Ni and further containing 0.01-0.1wt.% of elements selected from Mn, Cr, Mg, Zr, and Ca. By this method, superior workability can be obtained without causing deterioration in magnetic properties.
Inventors:
Yukihiro Oishi
Teruyuki Murai
Teruyuki Murai
Application Number:
JP10027793A
Publication Date:
October 30, 2000
Filing Date:
April 02, 1993
Export Citation:
Assignee:
Sumitomo Electric Industries, Ltd.
International Classes:
C22C19/07; C23C14/14; G11B5/64; G11B5/66; H01F10/16; (IPC1-7): C22C19/07; C23C14/14; G11B5/64; H01F10/16
Domestic Patent References:
| JP6386842A | ||||
| JP61189609A | ||||
| JP63210269A | ||||
| JP63100149A | ||||
| JP5964734A |
Attorney, Agent or Firm:
Hiroshi Yamano (1 person outside)
Previous Patent: VINYL CHLORIDE-BASED RESIN COMPOSITION AND MOLDED MATERIAL THEREOF
Next Patent: PREPARATION OF INSTANT NOODLE
Next Patent: PREPARATION OF INSTANT NOODLE