A constituent for polish, a manufacturing method for the same, and a magnetic polishing method

Title:

A constituent for polish, a manufacturing method for the same, and a magnetic polishing method

Document Type and Number:

Japanese Patent JP6220090

Kind Code:

B2

Abstract:

Provided are a polishing composition, in which oxidation of magnetic particles hardly occurs, and a magnetic polishing method. The polishing composition (1) contains magnetic particles, an antioxidant for suppressing oxidation of the magnetic particles, and water. A magnetic field is applied to the polishing composition (1) to form a magnetic cluster (3) that contains the magnetic particles, and the magnetic cluster (3) is brought into contact with an object (5) to be polished, to polish the object (5) to be polished.

More Like This:

JPH06240235	POLYCRYSTALLINE CUBIC BORON NITRIDE ABRASIVE GRAIN
JP2017001927	COMPOSITE PARTICLE FOR POLISHING, MANUFACTURING METHOD OF COMPOSITE PARTICLE FOR POLISHING AND SLURRY FOR POLISHING
JP2019172930	NON-FIRED CERAMIC FRICTION MATERIAL, BRAKE PAD, AND MANUFACTURING METHOD OF NON-FIRED CERAMIC FRICTION MATERIAL

Inventors:

Shuichi Tamada
Morinaga Hitoshi
Shota Hishida
Daisuke Yasui

Application Number:

JP2017044074A

Publication Date:

October 25, 2017

Filing Date:

March 08, 2017

Export Citation:

Click for automatic bibliography generation Help

Assignee:

Fujimi Incorporated Co., Ltd.

International Classes:

C09K3/14; B24B31/112; B24B37/00

Domestic Patent References:

JP2010214505A
JP2002544318A
JP2014095031A

Foreign References:

CN1959871A
WO2015046525A1

Attorney, Agent or Firm:

Tetsuya Mori
Suzuki Isobe
Hide Tanaka Tetsu
Yuki Yamada

Previous Patent: A providing device and a method for the same of an on-line shooting game

Next Patent: HANDWRITTEN CHARACTER ENTRY GUIDE