Title:
赤外線で急速かつ均一に基板を加熱する装置
Document Type and Number:
Japanese Patent JP2004511907
Kind Code:
A
Abstract:
A heating device comprises infrared radiation lamps 24, 26 designed to perform rapid thermal processing of the substrate 12 inside a reaction chamber 14 with a transparent window 34. The infrared lamps 24, 26 are arranged in two superposed stages A, B extending on a single side of the substrate 12, the lamps 24 of the lower stage A being arranged perpendicularly with respect to the lamps 26 of the upper stage B. Means for adjusting the supply power by group of lamps provide greater heating on the edges than in the centre of the substrate 12. A reflector 36 in the form of a distribution grid 38 is designed to reflect the infrared radiation to control the power ratios between the different heating zones. This results in uniform heating of the substrate 12 regardless of the geometry and dimensions thereof.
Inventors:
Rene, Pierre, Ducre
Frank, Laporte
Benoit, Pierre
Bashir, Smash
Frank, Laporte
Benoit, Pierre
Bashir, Smash
Application Number:
JP2002535156A
Publication Date:
April 15, 2004
Filing Date:
October 12, 2001
Export Citation:
Assignee:
JOINT INDUSTRIAL PROCESSORS FOR ELECTRONICS
International Classes:
H01L21/205; H01L21/00; H01L21/26; (IPC1-7): H01L21/26; H01L21/205
Attorney, Agent or Firm:
Kenji Yoshitake
Hiroyuki Nagai
Junpei Okada
Satoshi Nazuka
Hideyuki Mori
Hirohito Katsunuma
Kiyohiro Suzuki
Hiroyuki Nagai
Junpei Okada
Satoshi Nazuka
Hideyuki Mori
Hirohito Katsunuma
Kiyohiro Suzuki