Title:
DIAPHRAGM, VALVE, AND FILM FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2020/217961
Kind Code:
A1
Abstract:
Provided is a technology capable of suppressing the retention of particles in a diaphragm. A diaphragm (30) includes a metal thin plate (31), and a thin film layer (32) formed on the entirety of a first surface (liquid contact surface (31A)) of the thin plate (31). The thin film layer (32) includes: an annular body portion (33); an annular inside portion (34) positioned radially inward with respect to the body portion; and an annular outside portion (35) positioned radially outward with respect to the body portion (33). The inside portion (34) includes an inside inclined face (34A) that approaches the first surface from an outer peripheral edge to an inner peripheral edge thereof. The outside portion (35) includes an outside inclined face (35A) that approaches the first surface from an inner peripheral edge to an outer peripheral edge thereof.
Inventors:
INADA TOSHIYUKI (JP)
KONDO KENTA (JP)
NAKATA TOMOHIRO (JP)
WATANABE KAZUNARI (JP)
NAKATA TOMOKI (JP)
KONDO KENTA (JP)
NAKATA TOMOHIRO (JP)
WATANABE KAZUNARI (JP)
NAKATA TOMOKI (JP)
Application Number:
PCT/JP2020/015585
Publication Date:
October 29, 2020
Filing Date:
April 06, 2020
Export Citation:
Assignee:
FUJIKIN KK (JP)
International Classes:
F16K7/12
Domestic Patent References:
| WO2009113666A1 | 2009-09-17 |
Foreign References:
| JP2004060741A | 2004-02-26 |
Attorney, Agent or Firm:
YAMASHITA Yuji (JP)
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