Title:
ELECTRON BEAM-BASED EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE
Document Type and Number:
WIPO Patent Application WO/2024/112091
Kind Code:
A1
Abstract:
The present invention relates to an electron beam-based extreme ultraviolet light source device. A light source device according to one embodiment of the present invention outputs an extreme ultraviolet light source on the basis of an electron beam, and comprises: a chamber; an electron beam emission unit that generates an electron beam inside the chamber and comprises a cathode, a plurality of emitters including a carbon-based material and disposed spaced apart on the cathode, and a gate electrode disposed above the plurality of emitters and spaced apart from the plurality of emitters; and an anode which is located inside the chamber and spaced apart from the electron beam emission unit, and which becomes ionized and generates plasma when struck by the electron beam, whereby extreme ultraviolet rays are generated from the plasma. The anode includes, on the surface thereof, a silicon-based radiating material that generates the plasma.
Inventors:
PARK KYU CHANG (KR)
Application Number:
PCT/KR2023/018853
Publication Date:
May 30, 2024
Filing Date:
November 22, 2023
Export Citation:
Assignee:
WORLDBEAM SOLUTION CO LTD (KR)
UNIV INDUSTRY COOPERATION GROUP KYUNG HEE UNIV (KR)
UNIV INDUSTRY COOPERATION GROUP KYUNG HEE UNIV (KR)
International Classes:
H05G2/00; G03F7/20
Foreign References:
| KR102430082B1 | 2022-08-04 | |||
| JP2010123714A | 2010-06-03 | |||
| US20150034845A1 | 2015-02-05 | |||
| JP2009032776A | 2009-02-12 | |||
| US20110134405A1 | 2011-06-09 |
Attorney, Agent or Firm:
OH, Se Joong (KR)
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