GAS ANALYSIS DEVICE AND CONTROL METHOD

WIPO Patent Application WO/2023/074480

A1

A gas analysis device (1) comprises: a sample chamber (12) into which flows a sample gas (9) to be measured, the sample chamber being provided with a dielectric wall body structure; a plasma generation mechanism (13) that generates a plasma (19) inside a pressure-reduced sample chamber by using an electric field and/or a magnetic field through the dielectric wall body structure; a gas input device (5) configured such that only the sample gas flows from a process chamber (102) into the sample chamber; a first detector (20) that filters ionized gas in the generated plasma and detects components in the plasma; and a second detector (80) that analyzes the light emission of ions in the plasma of the sample chamber and can output a second detection result (52) synchronized with a first detection result (51) of the first detector.

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NAGAO HIROFUMI (JP)
MIKI SHINICHI (JP)
TAKAHASHI NAOKI (JP)
MURTHY PRAKASH SREEDHAR (JP)

PCT/JP2022/038848

May 04, 2023

October 19, 2022

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ATONARP INC (JP)

H01J49/00; G01N21/27; G01N27/62; H01J49/10; H01J49/14

WO2020196452A1

2020-10-01

JPH0992200A	1997-04-04
JPH08152408A	1996-06-11

IMAI Akira (JP)

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