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Patent Searching and Data


Title:
MAGNETRON SPUTTERING DEVICE AND CONTROL METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2023/122900
Kind Code:
A1
Abstract:
The embodiments of the present application relate to the technical field of magnetron sputtering. Provided are a magnetron sputtering device and a control method therefor. The magnetron sputtering device in the embodiments of the present application comprises a housing, a substrate bearing apparatus, a target material bearing apparatus, a cooling capacity supply apparatus, at least two target material partition cooling apparatuses, and at least two substrate multi-partition cooling apparatuses. The at least two target material partition cooling apparatuses are mounted on the side of a target material on the target material bearing apparatus that is away from the substrate bearing apparatus, and correspond to a plurality of positions of the target material. The at least two target material partition cooling apparatuses may respectively correspondingly cool a plurality of different areas on the target material, and the temperatures of the plurality of areas on the target material can be respectively accurately and quickly controlled. The substrate partition cooling apparatuses may respectively correspond to a plurality of different areas on a substrate, and accurately and quickly adjust the temperatures of the plurality of areas on the substrate. Therefore, the thickness of a thin-film layer and the uniformity of a thin-film resistor are improved, and the requirements of advanced process development for various performance parameters can be met.

Inventors:
WANG XIAO (CN)
ZHU JINGHUA (CN)
Application Number:
PCT/CN2021/141750
Publication Date:
July 06, 2023
Filing Date:
December 27, 2021
Export Citation:
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Assignee:
HUAWEI TECH CO LTD (CN)
International Classes:
C23C14/34; C23C14/35; C23C14/50
Foreign References:
JP2007254827A2007-10-04
CN110819961A2020-02-21
US20020100680A12002-08-01
CN105575871A2016-05-11
CN105483619A2016-04-13
Attorney, Agent or Firm:
BEIJING RUN ZEHENG INTELLECTUAL PROPERTY LAW FIRM (CN)
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