To provide a device capable of regulating timing between deflectors in a short time.
The charged particle beam lithography apparatus includes a DAC amplifier unit 132 switched from the (n-1)-th beam ON to beam OFF after the first delay time from a timing signal of the n-th beam ON, the blanking deflector 212 for generating alternately the beam ON/OFF, by a deflection voltage from the DAC amplifier unit 132, a DAC amplifier unit 134 for starting a voltage change toward the n-th beam ON after the second delay time from the timing when the DAC amplifier unit 132 issues the timing signal, the deflector 205 for controlling a direction of a beam, by a deflection voltage from the DAC amplifier unit 134, and a setter 114 for setting the first delay time, to make an integrated current obtained from a correlation results between an evaluating time used in stead of the first delay time and an integrated current of a current at the beam obtained in the evaluating time, get shorter than a change start time from a fixed state of the integrated current.
COPYRIGHT: (C)2011,JPO&INPIT
Kimura Hayato
Kei Hasegawa
Sengoku Yasuo
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Tetsuma Ikegami