ACTIVE RAY SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE RAY SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMATION METHOD AND MANUFACTURING METHOD OF ELECTRONIC DEVICE

Title:

ACTIVE RAY SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE RAY SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMATION METHOD AND MANUFACTURING METHOD OF ELECTRONIC DEVICE

Document Type and Number:

Japanese Patent JP2017116880

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To provide an active ray sensitive or radiation sensitive resin composition excellent in roughness property and capable of suppressing generation of application defect and a pattern formation method using the same.SOLUTION: An active ray sensitive or radiation sensitive resin composition contains (A) a resin containing a repeating unit having at least 2 lactone structures and (B) a compound generating acid by irradiation of active ray or radiation and percentage content of a fluorine atom of the compound is 0 to 0.20 based on total mass of the total atom contained in the compound.SELECTED DRAWING: None

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Inventors:

TANAKA TAKUMI
FURUYA SO
GOTO AKIYOSHI

Application Number:

JP2015255178A

Publication Date:

June 29, 2017

Filing Date:

December 25, 2015

Export Citation:

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Assignee:

FUJIFILM CORP

International Classes:

G03F7/004; C08F20/18; G03F7/038; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Kurata Masatoshi
Nobuhisa Nogawa
Takashi Mine
Naoki Kono
Katsu Sunagawa
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi

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