Title:
ALUMINUM ALLOY FOR FLUORINATION
Document Type and Number:
Japanese Patent JP3691089
Kind Code:
B2
Abstract:
PURPOSE: To obtain an Al alloy usable as the material of devices used in a semiconductor producing process.
CONSTITUTION: This Al alloy consists of 2.0-4.5% Mg, 0.003-0.015% Ti and the balance Al with inevitable impurities or further contains 0.001-0.005% B. Among the inevitable impurities, the amts. of Si and Fe have been regulated to each ≤0.04% and the amts. of Cu, Mn, Cr and Zn have been regulated to each ≤0.02%. When this alloy is fluorinated, a uniform fluorinated passive film is formed on the surface and the resultant alloy exhibits superior corrosion resistance even to highly corrosive gases such as halogen and can be used as the material of devices used in a semiconductor producing process. The devices can be made light in weight.
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Inventors:
Tadahiro Ohmi
Kazuro Chiba
Yoshio Kume
Kazu Mikasa
Maeno Matagoro
Ryoji Hirayama
Hiroto Izumi
Kazuro Chiba
Yoshio Kume
Kazu Mikasa
Maeno Matagoro
Ryoji Hirayama
Hiroto Izumi
Application Number:
JP25611194A
Publication Date:
August 31, 2005
Filing Date:
September 27, 1994
Export Citation:
Assignee:
Stella Chemifa Co., Ltd.
International Classes:
C22C21/06; C23C8/06; (IPC1-7): C22C21/06; C23C8/06
Domestic Patent References:
| JP4066657A | ||||
| JP2263972A | ||||
| JP61091352A | ||||
| JP58016059A | ||||
| JP4371544A |
Attorney, Agent or Firm:
Yuki Yokoi